Name: Photomask Fabrication Technology (Professional Engineering) (en Inglés)
Price: 652967.00 COP
Availability: InStock
Author: Benjamin Eynon; Banqiu Wu
ISBN: 9780071445634

portada Photomask Fabrication Technology (Professional Engineering) (en Inglés)

Formato

Libro Físico

Editorial

Editorial Mcgraw-Hill

Autor

Benjamin Eynon; Banqiu Wu

Año

2005

Idioma

Inglés

N° páginas

500

Encuadernación

Tapa Dura

Peso

2.05

ISBN13

9780071445634

N° edición

Categorías

Ingeniería electrónica

Photomask Fabrication Technology (Professional Engineering) (en Inglés)

Benjamin Eynon; Banqiu Wu (Autor) · Editorial Mcgraw-Hill · Tapa Dura

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Reseña del libro "Photomask Fabrication Technology (Professional Engineering) (en Inglés)"

Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product.Photomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool’s source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technologists are necessary to fabricate modern microelectronics. Thus the rapid recent growth of the field and the need for this book.This text details the science and technology of industrial photomask production, including fundamental principles, industrial production flows, technological evolution and development, and state of the art technologies. Focusing on industrial applications rather than pure science, the goal of the book is to provide a comprehensive reference for any engineer developing microelectronic manufacturing processes